Reliability
Sartorius lab balances have earned an excellent reputation
the world over for their performance and operating reliability.
In the new LA Reference as well, this reliability is not only based
on its technological advantages, but also on its operating design.
The interaction between the display, eye, control panel and hand
determines how proficiently an application is run. The more complex
the operating sequence, the higher the error rate. Not so with the
LA Reference. It focuses on what is really important for efficient
work sequences; user-friendly keys with positive click action, a
clearly structured user interface with understandable prompts in
a choice of languages, and an easy -to-read display featuring optimized
contrast.
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Ruggedness
You can actually "feel" the quality. Right at the first
touch, you can tell that the LA Reference offers exceptional ruggedness
that sets this balance apart from the rest. A sturdy, yet sleek metal
housing, a robotically etched monolithic weigh cell extremely resistant
to interference and a high-grade keypad overlay give the balance the
resilience it needs to stand up to tough daily use. Every last detail
is meticulously designed with this in mind. Take the coated keys,
for example. They make even deep scratches disappear after a short
time, almost as if by magic.
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Resolution
The resolution of the balance is noticeably high. What do the controllers
of a high-perfoemance amplifier, the lens of a professional camera
and the control unit of an LA Reference have in common? The spontaneous
feel of quality and precision, which only in this form can deliver
results that are reference standards by nature. The stability and
consistent repeatability of the weight readouts displayed by the LA
Reference are outstanding. In fact, the LA Reference offers the user
the same unique precision that characterizes its own manufacturing
process to ensure perfect results, every time, all the time. In particular,
the proprietary monolithic weigh cell manufactured by Sartorius sets
technological and metrological benchmarks.
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